US Patent Issued to NANYA TECHNOLOGY on April 14 for "Semiconductor device and manufacturing method thereof" (Taiwanese Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,466, issued on April 14, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan).

"Semiconductor device and manufacturing method thereof" was invented by Sheng Chieh Tsai (New Taipei City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The manufacturing method of a semiconductor device includes providing a word line structure and a hard mask stack on the word line structure. The word line structure includes an active area, a word line, an isolation structure and a protection layer, the word line covers a portion of the active area, the isolation structure is adjacent to the active area and the word line, and the protection layer cov...