US Patent Issued to NANYA TECHNOLOGY on April 14 for "Method of forming mask with reduced feature sizes" (Taiwanese Inventor)

ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,713, issued on April 14, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan).

"Method of forming mask with reduced feature sizes" was invented by Jung-Tzu Peng (Taoyuan City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of manufacturing a semiconductor device is provided. The method includes: providing a substrate; forming a plurality of first mask layers over the substrate, wherein each of the first mask layers extends along a first direction; forming a plurality of second mask layers over the substrate, wherein each of the second mask layers extends along a second direction different from the first direction; patter...