US Patent Issued to NanoClear Technologies on Feb. 10 for "Atomic layer roughness reducing methods and devices" (California Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,546,013, issued on Feb. 10, was assigned to NanoClear Technologies Inc. (Pasadena, Calif.).

"Atomic layer roughness reducing methods and devices" was invented by Harold Frank Greer (Los Angeles) and Rehan Kapadia (Los Angeles).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods described herein allow for a smoothing of a particular material on a substrate independently of smoothing a different material on the substrate. Both materials may be exposed to the same reactant but form different skins (e.g., reactive layers). One skin may allow for smoothing of one material, while the other skin may protect or preserve the underlying material. Removing one o...