US Patent Issued to NAN YA PLASTICS on Feb. 17 for "Transparent solder mask protection film, method for producing the same, and method for using the same" (Taiwanese Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,552,130, issued on Feb. 17, was assigned to NAN YA PLASTICS Corp. (Taipei, Taiwan).

"Transparent solder mask protection film, method for producing the same, and method for using the same" was invented by Te-Chao Liao (Taipei, Taiwan), Chun-Che Tsao (Taipei, Taiwan) and Cheng-Hung Chen (Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A transparent solder mask protection film, a method for producing the same, and a method for using the same are provided. The transparent solder mask protection film includes a first film layer, a second film layer, and a release film material. The first film layer is a polyester base film layer. The second fil...