US Patent Issued to MURATA MANUFACTURING on Feb. 24 for "Integrated RC architecture, and methods of fabrication thereof" (French Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,563,839, issued on Feb. 24, was assigned to MURATA MANUFACTURING Co. LTD. (Nagaokakyo, Japan).

"Integrated RC architecture, and methods of fabrication thereof" was invented by Stephane Bouvier (Cairon, France), Larry Buffle (Caen, France) and Sophie Gaborieau (Sainte Honorine du Fay, France).

According to the abstract* released by the U.S. Patent & Trademark Office: "RC architectures are provided that include a substrate provided with a capacitor having a thin-film top electrode portion at a surface of the substrate on one side thereof. The resistance provided in series with the capacitor is controlled by providing a contact plate, spaced from the thin-film top electrode portion, and...