US Patent Issued to MURATA MANUFACTURING on April 21 for "Film capacitor having nitrogen atom aggregation regions" (Japanese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,247, issued on April 21, was assigned to MURATA MANUFACTURING Co. LTD. (Nagaokakyo, Japan).

"Film capacitor having nitrogen atom aggregation regions" was invented by Shunsuke Akiba (Nagaokakyo, Japan), Tomomichi Ichikawa (Nagaokakyo, Japan), Yumie Kawasaki (Nagaokakyo, Japan) and Kazuto Yamazaki (Nagaokakyo, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A film capacitor that includes: a dielectric resin film having a first surface and a second surface opposite each other; a first metal layer on the first surface; and a second metal layer on the second surface, wherein in a mapping image of nitrogen atoms observed by energy dispersive X-ray s...