US Patent Issued to MORRISON OPTOELECTRONICS on Feb. 17 for "Anti-scattering and anti-interference coating pattern structure of an optical film" (Taiwanese Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,554,045, issued on Feb. 17, was assigned to MORRISON OPTOELECTRONICS LTD. (Taipei, Taiwan).

"Anti-scattering and anti-interference coating pattern structure of an optical film" was invented by Chin-Chen Kuo (Taipei, Taiwan), Sheng-Wei Wang (Taipei, Taiwan), Tsung-Hsiu Wu (Taipei, Taiwan) and Yun-Hui Tai (Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An anti-scattering and anti-interference coating pattern structure of an optical film, wherein an optical film is formed on a substrate, the characterize is: the periphery of the optical film is a non-straight zigzag lines or multi-curved inner edge lines, such that can be used to reduce stra...