ALEXANDRIA, Va., June 9 -- United States Patent no. 12,652,988, issued on June 9, was assigned to Momentum Optics (Longmont, Colo.).

"Thermally guided chemical etching of a substrate and real-time monitoring thereof" was invented by Jeremy Goeckeritz (Longmont, Colo.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of controlling a substrate etching process includes disposing a bottom surface or a top surface of a substrate adjacent to volume of etching fluid to produce an etchant-substrate interface and heating the etchant-substrate interface via spatially controlled electromagnetic radiation. The method also includes transmitting a monitoring beam through the substrate, the substrate and volume of e...