ALEXANDRIA, Va., May 19 -- United States Patent no. 12,630,922, issued on May 19, was assigned to MKS Inc. (Andover, Mass.).
"Microwave system for microwave-assisted surface chemistry annealing of ALD processes utilizing microwave radiation energy" was invented by Mohammad Kamarehi (Andover, Mass.), Ilya Pokidov (Andover, Mass.) and Kenneth B Trenholm (Andover, Mass.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A microwave system for use within a microwave-assisted thermal atomic layer deposition system is disclosed which include at least one microwave generator configured to output at least one microwave signal, at least one waveguide assembly in communication with the at least one microwave generator and...