US Patent Issued to Mitutoyo on Sept. 23 for "Metrology system utilizing points-from-focus type processes with glare reduction" (Washington Inventor)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,423,779, issued on Sept. 23, was assigned to Mitutoyo Corp. (Kanagawa-ken, Japan).

"Metrology system utilizing points-from-focus type processes with glare reduction" was invented by Pavel Ivanovich Nagornykh (Kirkland, Wash.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A metrology system is provided including a lighting configuration and camera which are controlled to acquire image stacks of a workpiece, wherein each image stack is acquired utilizing different lighting (e.g., corresponding to different lighting positions). Sets of pixel intensity values from the image stacks are utilized to determine a composite stack which includes one pixel intensi...