ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,730,375, issued on Sept. 8, was assigned to MITSUBISHI GAS CHEMICAL COMPANY INC. (Tokyo).
"Resist composition and method for using resist composition" was invented by Takumi Okada (Niigata, Japan), Hideyuki Sato (Niigata, Japan), Masayuki Katagiri (Niigata, Japan) and Shu Suzuki (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a resist composition which contains a resin (A) and a solvent (B) that contains a compound (B1) represented by general formula (b-1), wherein the content of the active ingredients based on the total amount of the resist composition is 45% by mass or less.(In formula (b-1), R1 represents an alkyl group having from ...