US Patent Issued to MITSUBISHI GAS CHEMICAL on Sept. 8 for "Anti-reflection substrate" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,729,320, issued on Sept. 8, was assigned to MITSUBISHI GAS CHEMICAL COMPANY INC. (Tokyo).

"Anti-reflection substrate" was invented by Yoshiaki Yamamoto (Saitama, Japan) and Shota Wakayama (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an antireflection substrate formed by laminating the following layers (A), (B), (C) and (D) in this order: a substrate layer (A), a hard coating layer (B), a light absorbing layer (C), and a low refractive index layer (D), formed by curing a low refractive index resin composition containing an active energy ray-curable resin, hollow silica and a fluorine compound by an active energy ray, where the film t...