US Patent Issued to Mitsubishi Gas Chemical on Sept. 15 for "Compound, (co)polymer, composition, method for forming pattern, and method for producing compound" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,735,382, issued on Sept. 15, was assigned to Mitsubishi Gas Chemical Co. Inc. (Tokyo).

"Compound, (co)polymer, composition, method for forming pattern, and method for producing compound" was invented by Tadashi Omatsu (Hiratsuka, Japan), Masahiro Matsumoto (Niigata, Japan), Michihiro Yuri (Niigata, Japan), Kentaro Kataoka (Niigata, Japan), Takashi Sato (Hiratsuka, Japan) and Masatoshi Echigo (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention has an object to provide a composition or the like capable of forming a film having high resolution and high sensitivity. The above object can be achieved by the following compound. An iodi...