US Patent Issued to Mitsubishi Gas Chemical on Aug. 4 for "Compound, (co)polymer, composition, method for forming resist pattern, method for producing compound, and method for producing (co)polymer" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,699,321, issued on Aug. 4, was assigned to Mitsubishi Gas Chemical Co. Inc. (Tokyo).

"Compound, (co)polymer, composition, method for forming resist pattern, method for producing compound, and method for producing (co)polymer" was invented by Tadashi Omatsu (Hiratsuka, Japan), Masahiro Matsumoto (Niigata, Japan), Michihiro Yuri (Niigata, Japan), Kentaro Kataoka (Niigata, Japan), Takashi Sato (Hiratsuka, Japan) and Masatoshi Echigo (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An iodine-containing (meth)acrylate compound represented by formula (1):wherein R1 represents a hydrogen atom, methyl, or halogen; each R2 independently represents a hydrogen...