ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,551,905, issued on Feb. 17, was assigned to MITSUBISHI ELECTRIC Corp. (Tokyo).
"Foreign matter removal device" was invented by Ryusei Yamaguchi (Tokyo), Kota Kurihara (Tokyo), Eiji Imamura (Tokyo), Shigeru Iijima (Tokyo), Masazumi Chisaki (Tokyo) and Yoshiro Aoyagi (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A foreign matter removal device removes foreign matter contained in a fluid. The fluid is caused to flow into the trap portion and is separated into an inner fluid flowing inside a separation portion and an outer fluid flowing outside the separation portion. First foreign matter contained in the outer fluid and having a higher specific gra...