ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,559,623, issued on Feb. 24, was assigned to MITSUBISHI CHEMICAL Corp. (Tokyo).
"Resin composition and electromagnetic wave absorber" was invented by Shuta Iseki (Hiratsuka, Japan) and Hidekazu Shoji (Hiratsuka, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A resin composition for electromagnetic wave absorber may have large absorbance of electromagnetic wave, small transmittance and reflectance of electromagnetic wave, and small variation of reflectance depending on frequency of electromagnetic wave. An electromagnetic wave absorber may use such a composition. The resin composition may contain 0.1 to 10.0 parts by mass of an electromagnetic wave ...