US Patent Issued to Microworks Solutions on March 24 for "Polyamide-based film, preparation method thereof, and cover window and display device comprising the same" (South Korean Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,583,970, issued on March 24, was assigned to Microworks Solutions Co. Ltd. (Chungcheongnam-do, South Korea).

"Polyamide-based film, preparation method thereof, and cover window and display device comprising the same" was invented by Dae Seong Oh (Gyeonggi-do, South Korea), Sun Hwan Kim (Gyeonggi-do, South Korea) and Jin Woo Lee (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The embodiments provide a polyamide-based film, which comprises a polyamide-based polymer and has an RSRA value of 3.4 m/N to 5.0 m/N as represented by the following Equation 1 based on the thickness of the film of 50 micro metre, and which is excellent in ...