US Patent Issued to MICROWORKS SOLUTIONS on April 21 for "Polyamide-based film, method of preparing the same, and cover window and display device comprising the same" (South Korean Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,606,674, issued on April 21, was assigned to MICROWORKS SOLUTIONS Co. LTD. (Chungcheongnam-do, South Korea).

"Polyamide-based film, method of preparing the same, and cover window and display device comprising the same" was invented by Hak Soo Lee (Gyeonggi-do, South Korea), Hye Jin Kim (Gyeonggi-do, South Korea) and Jin Woo Lee (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The embodiments relate to a polyamide-based film that is excellent in optical properties and mechanical properties, to a process for preparing the same, and to a cover window and a display device comprising the same. It comprises a polyamide-based polymer a...