ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,599, issued on July 7, was assigned to Microsoft Technology Licensing LLC (Redmond, Wash.).
"Method of fabricating a semiconductor device" was invented by Amrita Singh (Delft, Netherlands), Elvedin Memisevic (Lund, Sweden) and Peter Krogstrup Jeppesen (Copenhagen, Denmark).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device is fabricated by: forming a shadow wall on a substrate; subsequently growing a nanowire of semiconductor material on the substrate; and directionally depositing a layer of a further material on the nanowire from a direction selected such that the shadow wall casts a shadow on the nanowire, the shadow being a regio...