US Patent Issued to Micron Technology on Nov. 25 for "Wear leveling techniques using data characteristics" (Idaho Inventor)

ALEXANDRIA, Va., Nov. 25 -- United States Patent no. 12,481,583, issued on Nov. 25, was assigned to Micron Technology Inc. (Boise, Idaho).

"Wear leveling techniques using data characteristics" was invented by Giuseppe Cariello (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods, systems, and devices for wear leveling techniques using data characteristics are described. The described techniques provide for wear leveling across blocks of a memory system. A controller of the memory system may include additional criteria for determining a destination block for an operation, which may include a characteristic of data associated with the operation. The controller may select a destination block acc...