US Patent Issued to Micron Technology on June 9 for "Microelectronic devices including staircase structures and, merged source tier structures, and related memory devices and electronic systems" (Idaho Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,653,011, issued on June 9, was assigned to Micron Technology Inc. (Boise, Idaho).

"Microelectronic devices including staircase structures and, merged source tier structures, and related memory devices and electronic systems" was invented by Shuangqiang Luo (Boise, Idaho) and Nancy M. Lomeli (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "A microelectronic device is disclosed, comprising: a stack structure comprising vertically alternating conductive structures and insulating structures arranged in tiers, each of the tiers individually comprising one of the conductive structures and one of the insulating structures, the stack structure having...