ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,563,717, issued on Feb. 24, was assigned to Micron Technology Inc. (Boise, Idaho).
"Vertical digit line for semiconductor devices" was invented by Si-Woo Lee (Boise, Idaho) and Sangmin Hwang (Boise, Idaho).
According to the abstract* released by the U.S. Patent & Trademark Office: "Systems, methods and apparatus are provided for an array of vertically stacked memory cells having horizontally oriented access devices and access lines, and vertically oriented digit lines having a first source/drain region and a second source drain region separated by a channel region, and gates opposing the channel region, horizontal oriented access lines coupled to the gates and separated from a channe...