US Patent Issued to Micron Technology on Feb. 24 for "Microelectronic devices including implant regions adjacent to dielectric slot structures, and related memory devices, electronic systems, and methods" (Singaporean, American Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,563,728, issued on Feb. 24, was assigned to Micron Technology Inc. (Boise, Idaho).

"Microelectronic devices including implant regions adjacent to dielectric slot structures, and related memory devices, electronic systems, and methods" was invented by Zhiqiang Teo (Singapore), Chun Wei Ee (Singapore), Anson Lin (Singapore), Yuwei Ma (Singapore), Martin J. Barclay (Middleton, Idaho), John D. Hopkins (Meridian, Idaho) and Jordan D. Greenlee (Boise, Idaho).

According to the abstract* released by the U.S. Patent & Trademark Office: "A microelectronic device comprises lateral contact structures overlying a source structure and comprising conductive material, a cap material overlying the la...