ALEXANDRIA, Va., April 15 -- United States Patent no. 12,603,124, issued on April 14, was assigned to Micron Technology Inc. (Boise, Idaho).
"Methods of forming microelectronic devices" was invented by Fatma Arzum Simsek-Ege (Boise, Idaho), Kunal R. Parekh (Boise, Idaho) and Beau D. Barry (Boise, Idaho).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of forming a microelectronic device comprises forming a first microelectronic device structure comprising a first semiconductor structure, control logic circuitry including transistors at least partially overlying the first semiconductor structure, and a first isolation material covering the first semiconductor structure and the control logic circuitry. A...