US Patent Issued to mi2-factory on Sept. 8 for "Energy filter assembly for ion implantation system with at least one coupling element" (German Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,731,753, issued on Sept. 8, was assigned to mi2-factory GMBH (Jena, Germany).

"Energy filter assembly for ion implantation system with at least one coupling element" was invented by Constantin Csato (Jena, Germany), Florian Krippendorf (Jena, Germany) and Andre Zowalla (Jena, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "An energy filter assembly (1, 100, 200, 300) for ion implantation system is provided comprising an energy filter (25), a first filter frame (40), and at least one coupling element (50). The energy filter (25) has at least one filter element (25a) absorbing the beam energy of an ion beam (10). The at least one coupling element (...