US Patent Issued to METRYX on Feb. 10 for "Method and apparatus for controlling the temperature of a semiconductor wafer" (British, American Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,546,646, issued on Feb. 10, was assigned to METRYX Ltd. (Bristol, Great Britain).

"Method and apparatus for controlling the temperature of a semiconductor wafer" was invented by Gregor Elliott (Lydney, Great Britain), Eric Tonnis (San Jose, Calif.), Paul Harrison (Gloucester, Great Britain) and Mark Berry (Thornbury, Great Britain).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor wafer mass metrology method comprising: controlling the temperature of a semiconductor wafer by: detecting information relating to the temperature of the semiconductor wafer; and controlling cooling or heating of the semiconductor wafer based on the detected inform...