US Patent Issued to Metalenz on May 26 for "Spoof-resistant facial recognition through illumination and imaging engineering" (Massachusetts Inventors)

ALEXANDRIA, Va., May 26 -- United States Patent no. 12,639,983, issued on May 26, was assigned to Metalenz Inc. (Boston).

"Spoof-resistant facial recognition through illumination and imaging engineering" was invented by Robert C. Devlin (Stoneham, Mass.) and Xiangdong Wang (Carlisle, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein systems and methods of performing spoof resistant object recognition. In certain embodiments, a system for object recognition includes: an illumination device configured to illuminate an object; a sensor device, wherein the sensor device receives illumination light reflected off the object which includes polarization information; a processor; memory including ...