US Patent Issued to Merck Patent on Nov. 3 for "Inherently ferroelectric Hf-Zr containing films" (California, Massachusetts Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,781,342, issued on Nov. 3, was assigned to Merck Patent GmbH (Darmstadt, Germany).

"Inherently ferroelectric Hf-Zr containing films" was invented by Vijay Kris Narasimhan (Mountain View, Calif.), Jean-Sebastien Lehn (Winchester, Mass.), Karl Littau (Palo Alto, Calif.), Jacob Woodruff (Lexintogn, Mass.) and Ravindra Kanjolia (North Andover, Mass.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosed and claimed subject matter relates to crystalline ferroelectric materials that include a mixture of hafnium oxide and zirconium oxide having a substantial (i.e., approximately 40% or more) or majority portion of the material in a ferroelectric phase as ...