US Patent Issued to MELEXIS TECHNOLOGIES on Oct. 20 for "Electrical contact between separated semiconductor layers" (Belgian Inventor)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,766,636, issued on Oct. 20, was assigned to MELEXIS TECHNOLOGIES NV (Tessenderlo, Belgium).

"Electrical contact between separated semiconductor layers" was invented by Appolonius Jacobus Van Der Wiel (Tessenderlo, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for creating an electrical contact between semiconductor layers which are separated by an isolating connection layer. The method comprising: providing a layered stack comprising at least a first semiconductor layer, an isolating connection layer, and a second semiconductor layer, wherein the isolating connection layer is between first semiconductor layer and the second semiconduct...