ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,648, issued on March 17, was assigned to MEDTRONIC MINIMED INC. (Northridge, Calif.).
"Methods for controlling physical vapor deposition metal film adhesion to substrates and surfaces" was invented by Akhil Srinivasan (Woodland Hills, Calif.) and Yifei Wang (Sunnyvale, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of depositing of a film on a substrate with controlled adhesion. The method comprises depositing the film including metal, wherein the metal is deposited on the substrate using physical vapor deposition at a pressure that achieves a pre-determined adhesion of the film to the substrate. The pre-determined adhesion allows p...