ALEXANDRIA, Va., May 26 -- United States Patent no. 12,641,840, issued on May 26, was assigned to MediaTek Inc. (Hsinchu City, Taiwan).
"Self-aligned gate edge and local interconnect" was invented by Milton Clair Webb (Aloha, Ore.), Mark Bohr (Aloha, Ore.), Tahir Ghani (Portland, Ore.) and Szuya S. Liao (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Self-aligned gate edge and local interconnect structures and methods of fabricating self-aligned gate edge and local interconnect structures are described. In an example, a semiconductor structure includes a semiconductor fin disposed above a substrate and having a length in a first direction. A gate structure is disposed over the semiconductor fi...