ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,735,519, issued on Sept. 15, was assigned to Maruzen Petrochemical Co. Ltd. (Tokyo).

"Polymer and method for producing same, and resin composition for resist" was invented by Hiromichi Aihara (Ichihara, Japan) and Tomohiro Masukawa (Ichihara, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "[Problem to be Solved]The present invention provides a polymer comprising a structural unit derived from p-hydroxystyrene and a structural unit having a structure in which a carboxylic acid is protected by an acetal group, wherein the structural unit generated by elimination of the acetal group or migration of the acetal group during the production process is ex...