ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,443, issued on June 23, was assigned to Maruzen Petrochemical Co. Ltd. (Tokyo).

"High purity 4-hydroxystyrene solution, method of producing the same, and method of producing 4-hydroxystyrene polymer" was invented by Yuma Hakoda (Ichihara, Japan), Ryo Fujisawa (Ichihara, Japan), Kazuhiko Haba (Ichihara, Japan), Daisuke Tabata (Ichihara, Japan), Yoshiyuki Furuya (Ichihara, Japan), Ryo Sato (Ichihara, Japan) and Tomo Oikawa (Ichihara, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a 4-hydroxystyrene solution with high purity and good storage stability that is suitable as a source for producing a 4-hydroxystyrene polymer on a commerci...