US Patent Issued to MAGNATECH on Aug. 11 for "Method for preparing silicon anode active material in which nano-silicon mixture is inserted into pores of coffee grounds" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,706,313, issued on Aug. 11, was assigned to MAGNATECH Co. LTD. (Jangseong-gun, South Korea).

"Method for preparing silicon anode active material in which nano-silicon mixture is inserted into pores of coffee grounds" was invented by Jin-Pyo Lee (Daejeon, South Korea) and Jun-Pyo Park (Gwangju, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for preparing a silicon anode active material in which a nano-silicon mixture is inserted into pores of coffee grounds according to the present disclosure can contribute to the protection of the natural environment through the preparation of a high-capacity silicon anode active material for a lith...