US Patent Issued to MACRONIX INTERNATIONAL on Sept. 8 for "Semiconductor device and method for forming the same" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,180, issued on Sept. 8, was assigned to MACRONIX INTERNATIONAL Co. LTD. (Hsinchu, Taiwan).

"Semiconductor device and method for forming the same" was invented by Dai-Ying Lee (Hsinchu County, Taiwan) and Cheng-Hsien Lu (Taoyuan City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Semiconductor devices and a method for forming a semiconductor device are provided. The semiconductor device includes a substrate, a first semiconductor structure on the substrate, a second semiconductor structure on the first semiconductor structure, and a wire coupled between the substrate and the first semiconductor structure. The first semiconductor structure and...