US Patent Issued to LUTRONIC on Sept. 1 for "Treatment apparatus for denaturing tissue using RF energy, control method thereof, and treatment method using the same" (South Korean Inventor)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,721,667, issued on Sept. 1, was assigned to LUTRONIC Corp. (Goyang-si, South Korea).

"Treatment apparatus for denaturing tissue using RF energy, control method thereof, and treatment method using the same" was invented by Kwangchon Ko (Goyang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a treatment apparatus for denaturing tissue using RF energy having multiple frequencies, a control method thereof, and a treatment method using the same, in which skin treatment is performed using the RF energy with multiple-frequencies different in depth of delivering the RF energy into the tissue. The frequencies of the RF energy may be ...