US Patent Issued to LUMILEDS SINGAPORE on Aug. 25 for "Crack sensitivity reduction in porous optical layers" (Dutch, American Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,927, issued on Aug. 25, was assigned to LUMILEDS SINGAPORE PTE. LTD. (Singapore).

"Crack sensitivity reduction in porous optical layers" was invented by Marcel Rene Bohmer (Eindhoven, Netherlands) and Emma Dohner (Redwood City, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A lighting device is disclosed that includes a plurality of light emitting diodes arranged in an array, trenches disposed between the light emitting diodes, and a scattering layer disposed in the trenches, the scattering layer including a binder matrix, a plurality of scattering particles disposed in the binder matrix, and a plurality of porous particles containing a gas, ...