ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,773,581, issued on Oct. 27, was assigned to LG Electronics Inc. (Seoul, South Korea).

"Mask apparatus" was invented by Yeongcheol Mun (Seoul, South Korea), Dongkwon An (Seoul, South Korea) and Sejeong Ahn (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A mask apparatus according to an implementation of the present disclosure includes a front body; a rear body which is configured to be coupled to the rear surface of the front body and includes: a pair of accommodation portions protruding from a front surface thereof toward the front body; an exhaust port formed under the pair of accommodation portions; and an exhaust flow path guide pr...