ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,676, issued on March 17, was assigned to LG Electronics Inc. (Seoul, South Korea).
"Chemical vapor deposition apparatus" was invented by Jinsan Moon (Seoul, South Korea) and Wonbae Park (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Discussed is a chemical vapor deposition apparatus that includes a reaction chamber with an open top and an open bottom, at least one inner partition wall can be in the reaction chamber and can divide an inner space of the reaction chamber in a height direction to form a plurality of division chambers. A heater can be further disposed at an outer surface of the reaction chamber, a plurality of upper ...