ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,702,873, issued on Aug. 11, was assigned to LG Electronics Inc. (Seoul, South Korea).

"Mask apparatus" was invented by Hojung Kim (Seoul, South Korea), Yeongcheol Mun (Seoul, South Korea), Yongmin Kim (Seoul, South Korea), Chiyoung Choi (Seoul, South Korea) and Sejin Choi (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A mask apparatus includes a mask body that defines a suction hole and a discharge hole, a face guard detachably coupled to a rear surface of the mask body by magnetic force, and an air cleaning module configured to filter external air and supply the filtered air to a breathing space. The face guard includes magnetic bod...