US Patent Issued to LG CHEM on March 17 for "Polymer resin compound, method for producing same, and photosensitive resin composition comprising same" (South Korean Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,393, issued on March 17, was assigned to LG CHEM Ltd. (Seoul, South Korea).

"Polymer resin compound, method for producing same, and photosensitive resin composition comprising same" was invented by Misun Yoon (Daejeon, South Korea), Sung Ho Chun (Daejeon, South Korea) and Minyoung Lim (Daejeon, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present specification provides a polymer resin compound, a method for preparing the same, a photosensitive resin composition including the polymer resin compound, and a photosensitive material formed using the photosensitive resin composition."

The patent was filed on Oct. 22, 2020, under Applic...