US Patent Issued to LEICA MICROSYSTEMS CMS on Sept. 23 for "Oblique plane microscope and method for correcting an aberration in an oblique plane microscope" (German Inventor)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,422,671, issued on Sept. 23, was assigned to LEICA MICROSYSTEMS CMS GMBH (Wetzlar, Germany).

"Oblique plane microscope and method for correcting an aberration in an oblique plane microscope" was invented by Christian Schumann (Lich, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "An oblique plane microscope includes an optical imaging system configured to form an image of an object. The optical imaging system includes a telescope system with an optical zoom system, which is adjustable for adapting a magnification of the telescope system to a ratio between two refractive indices, one of which being associated with an object side of the telescope ...