US Patent Issued to LASERTEC on July 28 for "Light source apparatus, inspection apparatus, exposure apparatus, light source control method, inspection method, and exposure method" (Japanese Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,232, issued on July 28, was assigned to LASERTEC Corp. (Yokohama, Japan).

"Light source apparatus, inspection apparatus, exposure apparatus, light source control method, inspection method, and exposure method" was invented by Ko Gondaira (Yokohama, Japan), Kosei Ishibashi (Yokohama, Japan) and Hirokazu Seki (Yokohama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A light source apparatus according to the present disclosure includes an input optical system including a first optical member configured to irradiate a target material with excitation light, an output optical system including a second optical member configured to extract light gener...