US Patent Issued to LANDMARK OPTOELECTRONICS on July 28 for "Semiconductor device" (Taiwanese Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,576, issued on July 28, was assigned to LANDMARK OPTOELECTRONICS Corp. (Tainan City, Taiwan).

"Semiconductor device" was invented by Hung-Wen Huang (Tainan City, Taiwan), Yung-Chao Chen (Tainan City, Taiwan), Yi-Hsiang Wang (Tainan City, Taiwan) and Wei Lin (Tainan City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a substrate, a buffer layer, a gradient layer, an active layer, a window layer, and an optical filtering layer. The substrate includes a first element and a second element. The buffer layer is disposed on the substrate. The gradient layer is formed on the buffer layer, and includes sublayers. Each ...