US Patent Issued to Lam Research on Sept. 29 for "Control of metallic contamination from metal-containing photoresist" (California Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,748,352, issued on Sept. 29, was assigned to Lam Research Corp. (Fremont, Calif.).

"Control of metallic contamination from metal-containing photoresist" was invented by Daniel Peter (Sunnyvale, Calif.), Samantha SiamHwa Tan (Newark, Calif.), Jengyi Yu (San Ramon, Calif.), Da Li (Newark, Calif.), Meng Xue (San Jose, Calif.), Wook Choi (San Jose, Calif.), Ji Yeon Kim (Fremont, Calif.), Alan J. Jensen (Mountain House, Calif.), Shahd Hassan Labib (San Jose, Calif.), Younghee Lee (Pleasanton, Calif.) and Hongxiang Zhao (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Various techniques for controlling metal-containing contamination on a semi...