US Patent Issued to Lam Research on Oct. 27 for "Systems and methods for providing shunt cancellation of parasitic components in a plasma reactor" (Oregon, Washington Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,776,757, issued on Oct. 27, was assigned to Lam Research Corp. (Fremont, Calif.).

"Systems and methods for providing shunt cancellation of parasitic components in a plasma reactor" was invented by Yaswanth Rangineni (Beaverton, Ore.), Sunil Kapoor (Vancouver, Wash.), Edward Augustyniak (Tualatin, Ore.) and Yukinori Sakiyama (West Linn, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods for negating an impedance associated with parasitic capacitance are described. One of the systems includes a plasma chamber having a housing. The housing includes a pedestal, a showerhead situated above the pedestal to face the pedestal, and a ceiling...