ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,832, issued on Oct. 20, was assigned to Lam Research Corp. (Fremont, Calif.).
"Multi-location gas injection to improve uniformity in rapid alternating processes" was invented by William Thie (Fremont, Calif.), Jisoo Kim (Pleasanton, Calif.), Alan J. Miller (Woodbridge, Calif.), Lai Wei (Cupertino, Calif.), Frank Y. Lin (Fremont, Calif.), Jun Hee Hee Han (San Ramon, Calif.), Jie Liu (Union City, Calif.), Conan Chiang (Cupertino, Calif.), Michael John Martin (Union City, Calif.) and Nicholas John Celeste (Oakland, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A gas delivery system configured to provide deposition and etch gases to a processing...