ALEXANDRIA, Va., June 12 -- United States Patent no. 12,300,489, issued on May 13, was assigned to Lam Research Corp. (Fremont, Calif.).
"UV cure for local stress modulation" was invented by Anirvan Sircar (Beaverton, Ore.), Fayaz A. Shaikh (Lake Oswego, Ore.), Kevin M. McLaughlin (Sherwood, Ore.) and Alexander Ray Fox (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Localized stresses can be modulated in a film deposited on a bowed semiconductor substrate by selectively and locally curing the film by ultraviolet (UV) radiation. A bowed semiconductor substrate can be asymmetrically bowed. A UV-curable film is deposited on the front side or the backside of the bowed semiconductor substrate. A ma...