US Patent Issued to Lam Research on March 24 for "Photoresist with multiple patterning radiation-absorbing elements and/or vertical composition gradient" (California Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,184, issued on March 24, was assigned to Lam Research Corp. (Fremont, Calif.).

"Photoresist with multiple patterning radiation-absorbing elements and/or vertical composition gradient" was invented by Timothy William Weidman (Sunnyvale, Calif.), Kevin Li Gu (Sunnyvale, Calif.), Katie Lynn Nardi (San Jose, Calif.), Chenghao Wu (Berkeley, Calif.), Boris Volosskiy (San Jose, Calif.) and Eric Calvin Hansen (Mountain View, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Various embodiments herein relate to techniques for depositing photoresist material on a substrate. For example, the tin techniques may involve providing the substrate in a reaction...