ALEXANDRIA, Va., July 16 -- United States Patent no. 12,671,066, issued on June 30, was assigned to Lam Research Corp. (Fremont, Calif.).

"Metrology enclosure including spectral reflectometry system for plasma processing system using direct-drive radiofrequency power supply" was invented by Alexander Miller Paterson (San Jose, Calif.), Daniel Guzman (San Jose, Calif.), William T. Hart (Castro Valley, Calif.), Cristian Siladie (San Ramon, Calif.), Michael John Martin (Fremont, Calif.), Yuhou Wang (Fremont, Calif.), Michael Drymon (Diablo Grande, Calif.), John Drewery (San Jose, Calif.), Eduardo Castanos-Martinez (Foster City, Calif.) and Jorge Luque (Redwood City, Calif.).

According to the abstract* released by the U.S. Patent & Trademark ...